The Microfabrication Laboratory is a core infrastructure of the Department of Excellence, specifically designed to support research on complex systems and the development of next-generation detectors for dark matter and cosmology. The facility is under construction and it will enable the in-situ fabrication of micro-structured devices,and the creation of advanced detectors and experimental prototypes.
The Lab will include a 70 m² cleanroom area (60 m² ISO 6 and 10 m² ISO 7) equipped with specialized air filtering of nanoparticles and thermo-hygrometric control, a crucial requirement for the development of high-sensitivity detectors. Advanced processes will be performed on various substrate types, ranging from small pieces to 4-inch wafers.
Facilities and Equipment
The available instrumentation will support a complete micro- and nano-fabrication workflow:
Lithography: Maskless laser lithography (LaserWriter MicroTech LW405-E) and e-beam lithography (ESSENCE EBL kit for SEM Tescan Vega) for high-resolution micro- and nano-patterning.
Thin Film Deposition: E-beam and thermal evaporation (Moorfield MiniLab080) and RF sputtering (Moorfield MiniLab026) for the controlled deposition of materials, including noble metals, gate dielectrics, superconductors.
Sample Treatment and Etching: Hoods for wet etching and spin coating; O₂ and Ar plasma cleaner (Gambetti Tucano) for surface activation and resist removal.
Characterization and Processing: SEM (Tescan Vega LMS) and optical microscopy for structural analysis; precision diamond wafer scriber for substrate segmentation.
Applications
Beyond its primary focus on fundamental physics, the laboratory will provide advanced technological support for a wide range of applied physics fields, including:
Nanotechnology and Advanced Materials
Micro- and Nano-photonics
Micro-electronics
Microfluidics and Biotechnologies
Detectors